Laser direct-write is a convenient method of microelectronics fabrication and pattern generation. Some details are described in the following article (pdf format).
In general, it is a maskless process of creating pattern of selective
material on selective substrates by transferring the material with a steady
pulsed laser beam. Minimum feature size of the order of 10 microns can be
produced.

Fig. 1. Scheme for dynamic laser direct-write.
© 1999 Anis Rahman